| 摘要 |
PURPOSE:To decrease the dosage required for the formation of a vertical section, reduce the approximity effect and optimize the formation of a minute pattern, by setting the speed of scanning with an electron beam and the moving speed of a stage to be optimum values, respectively, on the basis of the beam current value and minimum dosage on a sample at a set accelerating voltage. CONSTITUTION:An optimum accelerating voltage V and dosage D, which are determined according to the resist material, the ground material, the minimum pattern dimension, the resist process and so forth, are fed through an operator console unit 636. The minimum pattern dimension (x) and the beam diameter have the following relationship therebetween: x=nd (wherein (n) is an integer, n=4 in general). Therefore, the beam diameter corresponding to the minimum pattern dimension (x) is fed through the console unit 636. The deflection oscillation width l of the beam is generally an integer multiple of (d) (minimum picture element dimension) and therefore is set if the value of (d) is determined. In this stage, the accelerating voltage and beam diameter in the electrooptic system are set according to commands from a computer 630. |
