| 摘要 |
PURPOSE:To eliminate the need for opening the inside of a sample chamber to the atmospheric air every time samples are replaced with each other, thereby to improve productivity and prevent adverse effects of dusts, temperature changes and so forth, by arranging such that a sample to which a pattern has been transferred is carried from a first sample-preliminary chamber into a second sample- preliminary chamber, and the sample is subjected to the alignment for orientation flat in the first sample-preliminary chamber. CONSTITUTION:When a sample 25 is magnetically attached to an electrostatic chuck 38, a moving member 31 is lowered to a lower position to airtightly seal a sub-chamber 32. Subsequently, a support base 35 is moved to a lower position, that is until the sample 25 reaches a predetermined position in a first wafer- preliminary chamber 22a. After a photoelectric mask 27 and the sample 25 are aligned with each other, photoelectrons are applied to the sample 25 to expose a resist according to the mask pattern, so that the pattern is transferred to the sample 25. The sample 25 after the transfer is carried into a second wafer- preliminary chamber 23a by means of a carrying mechanism 43 provided on the second wafer-preliminary chamber 23a side and is then led out to the outside through a feed mechanism 42. |
