| 摘要 |
PURPOSE:To prevent any contamination, by opening one of a pair of stoppers of a vessel to introduce a high-purity H2 thereinto; heating the vessel above a specific temperature; opening the other stopper to reduce the pressure in the vessel; removing the residual oxygen or oxides; and filling the vessel with a reactive gas for a semiconductor. CONSTITUTION:One of a pair of stoppers of a heat-resistant corrosion-resistant hermetically-sealed high-pressure vessel is opened to introduce a high-purity H2 thereinto from the bottom thereof. The vessel is heated to 200-350 deg.C. The other stopper is opened to evacuate the vessel to about 10<-7>-10<-9>Torr. In this case, the reverse diffusion of the vacuum-pump oil is prevented, and no residual oxygen, water and hydrocarbon are present in the vessel. Therefore, when the vessel is filled with a reactive gas, which is purified by removing therefrom heavy metals, water and oxide impurities, no contamination occurs. |
