发明名称 SEMICONDUCTOR WAFER
摘要 PURPOSE:To prevent the fall of the yield of wafers and the sticking of extraneous substances on the surfaces thereof, by forming a mark such as a hole or a groove in a part of the surface of each wafer while maintaining the shape thereof to be round. CONSTITUTION:A very small hole 2a is formed as a mark in a part of the periphery of the surface of a round wafer 2. This hole 2a may be formed on the back side of the wafer 2. A groove 3a in the direction of the diameter may also be formed as a mark instead of said hole. In either case, the hole 2a or the groove 3a is formed to be small so as not to lower the yield of a circuit pattern which is formed on the surface of the wafer. In the case of the wafer 2 having the hole 2a formed as the mark, the positioning thereof in the directions X and Y is performed by utilizing directional air 9, and the mark 2a is detected by a mark sensor 11 while the wafer 2 is rotated by rotating rollers 10 which are made to contact with the wafer by said positioning. Then, the wafer is stopped at a position of rotation whereat the mark 2a is detected by the mark sensor 11, and thereby the positioning of the wafer in the direction theta is completed.
申请公布号 JPS58207621(A) 申请公布日期 1983.12.03
申请号 JP19820089662 申请日期 1982.05.28
申请人 HITACHI SEISAKUSHO KK 发明人 KOMORIYA SUSUMU;NAGATOMO HIROTO;MAEJIMA HIROSHI;NISHIZUKA HIROSHI
分类号 H01L21/02;(IPC1-7):01L21/02 主分类号 H01L21/02
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