发明名称 |
METHOD AND DEVICE FOR TRANSFERRING THIN PLATE-LIKE SUBSTRATE |
摘要 |
A method and device by which the yield of a thin plate-like substrate of a semiconductor integrated circuit, liquid crystal panel, etc., is improved by always transferring the substrate to each processing device in a highly clean damage-free state when the substrate is subjected to various kinds of treatment. A substrate is transferred through a gas tunnel through which a purging gas composed of in insert gas or a mixed gas of an inert gas and oxygen gas is made to flow. The concentrations of impurities in the gas tunnel are measured with a semiconductor laser detector, and the transfer of the substrate is controlled based on the obtained measured data. |
申请公布号 |
WO9724760(A1) |
申请公布日期 |
1997.07.10 |
申请号 |
WO1996JP03852 |
申请日期 |
1996.12.27 |
申请人 |
NIPPON SANSO CORPORATION;TODA, MASAYUKI;OHMI, TADAHIRO;ISHIHARA, YOSHIO |
发明人 |
TODA, MASAYUKI;OHMI, TADAHIRO;ISHIHARA, YOSHIO |
分类号 |
B65G49/07;G03F7/20;H01L21/00;H01L21/677;(IPC1-7):H01L21/68 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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