发明名称 METHOD AND DEVICE FOR TRANSFERRING THIN PLATE-LIKE SUBSTRATE
摘要 A method and device by which the yield of a thin plate-like substrate of a semiconductor integrated circuit, liquid crystal panel, etc., is improved by always transferring the substrate to each processing device in a highly clean damage-free state when the substrate is subjected to various kinds of treatment. A substrate is transferred through a gas tunnel through which a purging gas composed of in insert gas or a mixed gas of an inert gas and oxygen gas is made to flow. The concentrations of impurities in the gas tunnel are measured with a semiconductor laser detector, and the transfer of the substrate is controlled based on the obtained measured data.
申请公布号 WO9724760(A1) 申请公布日期 1997.07.10
申请号 WO1996JP03852 申请日期 1996.12.27
申请人 NIPPON SANSO CORPORATION;TODA, MASAYUKI;OHMI, TADAHIRO;ISHIHARA, YOSHIO 发明人 TODA, MASAYUKI;OHMI, TADAHIRO;ISHIHARA, YOSHIO
分类号 B65G49/07;G03F7/20;H01L21/00;H01L21/677;(IPC1-7):H01L21/68 主分类号 B65G49/07
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