发明名称 MEASURING METHOD OF TRAP LEVEL OF SMALL NUMBER OF CARRIER IN INTERFACE OF METAL OXIDE SEMICONDUCTOR TYPE DIODE
摘要 PURPOSE:To measure the trap level of a small number of carriers of the MOS type diode easily and efficiently by extracting a change of a depletion layer based on the thermal discharge of a small number of carriers after stopping the application of light pulse-waves as a transient change of high-frequency capacitance. CONSTITUTION:Light pulse-waves having energy of the width or more of a forbidden band are emitted from a light pulse generator 3 under the state in which the temperature of the MOS type diode 6 is varied by controlling a heater 9, and irradiated to the gate electrode side of the MOS type diode 6 through a semipermeable reflector plate 4. The irradiation of light pulse-waves is stopped, and the change of the depletion layer based on the thermal discharge of a small number of carriers in the MOS tupe diode 6 is measured by a high-frequency capacity meter 13 as the transient change of high-frequency capacitance. A high-frequency capacitance transient change signal transmitted from the high-frequency capacity meter 13 is multiplied by a weighting signal consisting of two pairs of rectangular waves and its differential signal is extracted in a signal control-processing device 7.
申请公布号 JPS58206135(A) 申请公布日期 1983.12.01
申请号 JP19820088739 申请日期 1982.05.27
申请人 SHIMADA RIKA KOGYO KK 发明人 USAMI AKIRA;TOKUDA YUTAKA;KANESHIMA SATOSHI
分类号 G01R31/26;H01L21/66 主分类号 G01R31/26
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