| 摘要 |
PURPOSE:To perform efficiently the development processing of a mask for screen printing, by providing the first nozzle from which a liquid swelling a part of a photosensitive material layer is jetted and the second nozzle from which a liquid developing the photosensitive material layer is jetted. CONSTITUTION:Water is jetted mistily from nozzles 13a, 13b... and 17a, 17b... arranged on the first and the third nozzle supporting materials to swell the unexposed part of the photosensitive material layer of a mask 11 to be subjected to the development processing. The water is jetted mistily for about one minute. When the unexposed part of the photosensitive material layer is swelled, jetting of misty water from nozzles 13a, 13b... and 17a, 17b... is stopped. Next, the second nozzle supporting material 14 is driven vertically, and the water is jetted showerily from nozzles 15a, 15b... to remove the unexposed part of said photosensitive material layer, namely perform the development processing. Though the duration of jetting of showery water is related to the driving speed of the nozzle supporting material 14 and the quantity of jetted water, the development processing is possible even if it is about 30sec. |
