| 摘要 |
PURPOSE:To enable to make the dimensions and shape of beams variable by a method wherein variable impedance loads are connected to at least one of deflectors in series or parallel, and these deflectors are connected to the same power source. CONSTITUTION:Two pieces of beam shaping aperture masks 11 and two pairs or more of the deflectors 13-16 are provided, thus the dimensions and shapes of charged beams are variably controlled, and the beam is irradiated onto the surface of a sample. Besides, the variable impedance loads 21-24 are connected in series or parallel to at least one of the deflectors 13-16, and the deflectors 13-16 are connected to the same power source 20. In this manner, the sensitivity of the deflectors 13-16 can be made variable, and accordingly the dimensions and shapes of the beams can be made variable. |
