发明名称 Purification of silicon dioxide particles e.g. quartz powder for producing quartz glass components used in semiconductor production or for optics
摘要 Silicon dioxide particles are purified by exposure to a flame (5) formed by burning a fuel gas which contains hydrogen and halogen components. Silicon dioxide particles are purified by exposure to a flame (5) formed by burning a fuel gas which contains a hydrogen component (preferably hydrogen) and a halogen component (preferably molecular halogen) to form volatile reaction products of the impurities. An Independent claim is also included for an apparatus for carrying out the above process.
申请公布号 DE19813971(A1) 申请公布日期 1999.10.07
申请号 DE19981013971 申请日期 1998.03.24
申请人 HERAEUS QUARZGLAS GMBH & CO. KG 发明人 DOBRAT, MARTIN
分类号 C03C1/02;(IPC1-7):C01B33/12 主分类号 C03C1/02
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