发明名称 |
Purification of silicon dioxide particles e.g. quartz powder for producing quartz glass components used in semiconductor production or for optics |
摘要 |
Silicon dioxide particles are purified by exposure to a flame (5) formed by burning a fuel gas which contains hydrogen and halogen components. Silicon dioxide particles are purified by exposure to a flame (5) formed by burning a fuel gas which contains a hydrogen component (preferably hydrogen) and a halogen component (preferably molecular halogen) to form volatile reaction products of the impurities. An Independent claim is also included for an apparatus for carrying out the above process.
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申请公布号 |
DE19813971(A1) |
申请公布日期 |
1999.10.07 |
申请号 |
DE19981013971 |
申请日期 |
1998.03.24 |
申请人 |
HERAEUS QUARZGLAS GMBH & CO. KG |
发明人 |
DOBRAT, MARTIN |
分类号 |
C03C1/02;(IPC1-7):C01B33/12 |
主分类号 |
C03C1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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