发明名称 EXPOSURE DEVICE
摘要 PURPOSE:To obtain a high efficiency of light emission in a desired wavelength region and keep the illuminance of a lamp constant, by controlling the temperature of the lamp with a cooling gas heated by a heater to cool the lamp at an optimum temperature in a far ultraviolet-ray exposure device having the Xe-Hg lamp. CONSTITUTION:The temperature of an inert gas 7b which cools a lamp 1 is detected by a detector 8 and is fed back to a temperature controller, and the temperature of the gas 7 is controlled through a gas piping 4 by a heater 6, and a gas 7a whose temperature is controlled is supplied to the lamp 1.
申请公布号 JPS58200225(A) 申请公布日期 1983.11.21
申请号 JP19820083047 申请日期 1982.05.19
申请人 HITACHI SEISAKUSHO KK 发明人 HIROSE HIDEYUKI;KOMATANI MASATOSHI
分类号 G03B27/54;G03F7/20;G03G15/04;H01L21/027 主分类号 G03B27/54
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