Light activated composition used to prepare chemically amplified photoresists, etc., includes a photoinitiator which will generate an acid when exposed to light at 240-390 nm

摘要

A light activated composition comprises: (a) one or more compounds which can be crosslinked using an acid and/or (b) one or more compounds which change solubility under the action of an acid; and (c) a photoinitiator (I) which will generate an acid when exposed to light at 240-390 nm and having a molar extinction coefficient, iota , of less than 10 at i-line (365 nm). Independent claims are included for: (1) A chemically amplified photoresist comprising the photosensitive acid generator (I); (2) A process for the production of an image comprising: (a) coating a substrate with the claimed light activated composition; (b) irradiating the coating at 340-390 nm to form the desired pattern; (c) heating the coating to 60-160 deg C; and (d) removing the more soluble sections of the coatings with an aqueous-alkaline developer. (3) A process for generating sulfonic acids using the photoacid generator (Ia).