发明名称 MANUFACTURING DEVICE OF SEMICONDUCTOR
摘要 PURPOSE:To accurately and rapidly position a circular mask by bringing a notch formed on the periphery of the mask coincident to a notch matching projection of a mask holder and bringing the mask coincident to the direction of the holder. CONSTITUTION:A light quantum generation signal is fed from a control circuit 10, and a light quantum beam 2 is emitted via a lens 3 to a mask 4. The passed beam 2 is emitted via a lens 5 to a wafer 6, which is thus exposed. After finishing the exposure via the lens 3, a signal is fed through a circuit 10 to a load control system 9, and used circular mask 4 is replaced by a new circular mask in a circular mask containing box 7. In the box 7, the mask 4 and the mask holder 12 are contained in such a manner that the mask 4 formed with the notch 14 coincides with the notch matching projection 13. The direction of the mask 4 can be accurately and rapidly operated without mistake merely by bringing the notch 14 coincident to the projection 13.
申请公布号 JPS58199524(A) 申请公布日期 1983.11.19
申请号 JP19820081389 申请日期 1982.05.17
申请人 HITACHI SEISAKUSHO KK 发明人 KAWASAKI KATSUHIRO;NAKAMURA KAZUMITSU
分类号 H01L21/68;G03F7/20;(IPC1-7):01L21/30 主分类号 H01L21/68
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