发明名称 METHOD FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE FOR LCD USING FOUR MASKS AND THIN FILM TRANSISTOR SUBSTRATE FOR LCD
摘要 PURPOSE: A method for manufacturing a thin film transistor substrate for LCD using four masks and a thin film transistor substrate for LCD are provided to protect a gate pad and prevent efficiently a leakage current. CONSTITUTION: A method for manufacturing a thin film transistor substrate for LCD using four masks and a thin film transistor substrate for LCD comprises the following steps. A gate wiring(22) is formed on an insulated substrate by using a first mask. A quadruple layer including a gate insulation film, a semiconductor layer(42), a contact layer, and a data conductive layer is formed on the substrate by using a second mask. A conductive pattern(71,73,75,76,77) is formed on an upper portion of the data conductive layer and an area around the data conductive layer by using a third mask. A data wiring(68) is formed by etching the data conductive layer without the conductive pattern. The contact layer uncovered with the conductive pattern is etched. A protection film is formed by using a fourth mask. The semiconductor layer uncovered with the protection film is etched.
申请公布号 KR20000024704(A) 申请公布日期 2000.05.06
申请号 KR19980041355 申请日期 1998.10.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG, MUN PYO
分类号 G02F1/136;(IPC1-7):G02F1/136 主分类号 G02F1/136
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