| 发明名称 |
Laser scanning method for annealing, glass flow and related processes |
| 摘要 |
A method for scanning the top surface of a semiconductor wafer prevents damage to the wafer (11) by ensuring that the laser beam (13) does not cross over the edge (11a) of the wafer during the scanning process nor approach within one (1) to two (2) millimeters to the edge of the wafer.
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| 申请公布号 |
US4415794(A) |
申请公布日期 |
1983.11.15 |
| 申请号 |
US19810244395 |
申请日期 |
1981.03.16 |
| 申请人 |
FAIRCHILD CAMERA AND INSTRUMENT CORPORATION |
发明人 |
DELFINO, MICHELANGELO;REIFSTECK, TIMOTHY |
| 分类号 |
H01L21/20;H01L21/268;H01L21/31;H01L21/3105;(IPC1-7):B23K27/00 |
主分类号 |
H01L21/20 |
| 代理机构 |
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