| 摘要 |
PURPOSE:To obtain a photosensitive material high in sensitivity capable of polymerizing a polymerizable compound by simple and rapid dry treatment in a short exposure time by forming a photosensitive layer composed of photosensitive silver halide, the polymerizable compound, and a specified hydrazine derivative on a support. CONSTITUTION:The photosensitive layer formed on the support is composed of a least the photosensitive silver halide, the polymerizable compound, and one of the hydrazine derivatives represented by formulae I and II in which R1 is H, optionally substituted alkyl, or the like; each of R2 and R3 is optionally substituted aryl; R4 is H, carbamoyl, or the like; DEV is a group reductive of silver halide; and LINK is a divalent bonding group. One of silver chloride, bromide, iodide, chlorobromide, chloroiodide, iodobromide, and chloroiodobromide is used for the photosensitive material and the polymerizable compound to be used for the photosensitive material is, generally, a compound capable of addition polymerization or ring opening polymerization.
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