SOLID STATE COLOR IMAGER AND METHOD OF MANUFACTURING THE SAME

摘要

A plurality of color filters (1, 2) are disposed on a semiconductor body for a solid-state imager including a plurality of photosensitive regions (5, 6, 7), and a filter of a third color is constructed by the overlapping between the filter members (1, 2) of a first color and a second color. The filter members are formed by a photographic exposure process. One of the filter members (1) which has a spectral transmittance substantially transmitting the light used for the exposure for use in forming the filter members (1, 2) is arranged as a lower layer closer to a substrate of the semiconductor body. When the upper filter (2) is formed, therefore, the lower filter (1) has no substantial effect on the exposure light reflected from the semiconductor body, giving a better spectral characteristic to the upper filter.