发明名称 RADIOSENSITIVE COMPOSITION AND PATTERN FORMATION USING IT
摘要 PURPOSE:To prepare a compsn. contg. iodine capable of obtaining a negative type pattern through irradiation of radiation, by adding an azide compd. a radiation- fixable iodine compd., and a polymer having compatibility with them. CONSTITUTION:The objective radiosensitive compsn. contains an azide compd. of formula I or II (A is O, S, CH2, CH2CH2, SO2, S2, CO, COO, SO3, CH=CH, CH=CHCO; X, Y, Z are each azide, H, alkyl, nitro, halogen, amino, alkoxy, OH, COOH, or the like), such as 4,4-diazidodiphenyl ether or p-azido-iodobenzene, an iodinated compd. having at least its moiety fixable in a polymer layer by irradiation of radiation, such as iodomethane, and a polymer having compatibility with said azido compd. and said iodinated compd., such as poly N-vinylcarbazole.
申请公布号 JPS58192033(A) 申请公布日期 1983.11.09
申请号 JP19820075231 申请日期 1982.05.07
申请人 HITACHI SEISAKUSHO KK 发明人 UENO TAKUMI;SHIRAISHI HIROSHI;IWAYAGI TAKAO;KOBASHI TAKAHIRO;NONOGAKI SABUROU
分类号 G03F7/008;G03F7/20;H01L21/027 主分类号 G03F7/008
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