发明名称 CHEMICAL TREATMENT DEVICE, CHEMICAL TREATMENT METHOD, AND METHOD OF PRODUCING CIRCUIT BOARD
摘要 PROBLEM TO BE SOLVED: To perform chemical treatment while suppressing the exposure of the liquid face of a chemical to air. SOLUTION: A cover 3 is floating on a chemical 5 which is stored in a chemical tank 1, and a tape board 7 is passed through opening parts 4a and 4b, so that the tape board 7 is dipped into the chemical 5 via the cover 3. While the tape board 7 is transported via rollers 6a to 6d in a state where the tape board 7 is dipped into the chemical 5, the tape substrate 7 is subjected to chemical treatment. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004358283(A) 申请公布日期 2004.12.24
申请号 JP20030155890 申请日期 2003.05.30
申请人 SEIKO EPSON CORP 发明人 GOMI TSUGIO
分类号 B08B3/04;C23F1/08;G03D3/00;G03F7/30;H01L21/304;H01L21/306;H01L21/3213;H05K1/00;H05K3/00;H05K3/06;(IPC1-7):B08B3/04 主分类号 B08B3/04
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