| 摘要 |
PURPOSE:To perform positioning of high accuracy without being influenced by the thickness of photo resist coating by a method wherein fixed segments are arranged by repetition in parallel or in a vertical direction to the standard of positioning. CONSTITUTION:The patterns of width PL and length aX are arranged by repetition at intervals of PS in parallel to the scanning direction 3 of a slit, and thus the positioning pattern of aX=6mum and aY=50mum approx. is formed. When slit scanning is performed, the level difference between the intensity of reflected light in the periphery of the pattern and that of reflected light indicating the pattern part becomes remarkable by the waveform of signal obtained, accordingly signals of good contrast can be obtained, and positioning can be performed at high accuracy. It is effective likewise even when the pattern of with PL and aY are repeated at intervals of PS in the vertical direction to the scanning direction 3 of the slit. |
