发明名称 INSPECTING DEVICE FOR DEFECT
摘要 PURPOSE:To improve the reliability of inspection by a method wherein a dichroic mirror is used for light-beam scan, beams are irradiated from the back side of a specular surface, a polarizing prism is fitted into an optical path, reflected beams from a sample surface are passed, and a real image is expanded and observed. CONSTITUTION:White beams from an irradiating unit 12 illuminate a wafer 1 through the dichroic galvano-mirror 6', the polarizing prism 13 and a scan lens 9. Illuminating beams are close to blue by the transmitting spectral characteristics of the mirror 6' and the prism 13 at that time. Beams reflected by the wafer are imaged to the real image by a lens 14 through the lens 9 and the prism 13, and expanded by a microscope 15 and observed. The naked eye is protected by a filter 16. According to the constitution, a circuit pattern and a scanning line can be viewed with eyes at the same time on the wafer, the setting of the wafer on a base can be confirmed at the beginning of inspection, and the conditions of inspection can be confirmed at an arbitrary time, thus improving the reliability of the operation.
申请公布号 JPS58192343(A) 申请公布日期 1983.11.09
申请号 JP19820075276 申请日期 1982.05.07
申请人 HITACHI SEISAKUSHO KK 发明人 SUDA TADASHI;HASE SHINOBU;TAKAMI KATSUMI
分类号 G01N21/88;G01N21/956;H01L21/66 主分类号 G01N21/88
代理机构 代理人
主权项
地址