| 摘要 |
PURPOSE:To quickly manufacture a photomask negative plate for manufacturing a semiconductor device, and to lighten an inspection, by manufacturing a reticle separately with respect to a separable chip pattern, and forming one chip pattern synthesized by combining and using its reticle. CONSTITUTION:An intermediate negative plate 14 is manufactured by reductively repeating a reticle 13 having a reticle pattern obtained by drawing only a pattern 9 of a common part unchangeable by a code. Subsequently, a final negative plate 15 is obtained by replacing a reticle having a reticle pattern 10 which draws only a pattern 8 changed at every code, on this intermediate plate 14, with the reticle 13, and repeating it. In this way, a photomask for which a short delivery is requested such as a mask ROM, a gate array, etc. is obtained by only manufacturing a reticle having a pattern of a part which is varied at every code, exposure data and a reticle are manufactured easily, the load of an inspection is lightened, and the manufacture is executed quickly. |
