| 摘要 |
PURPOSE:To reduce an amt. of gas produced out of an automatic developing machine, by processing an o-quinonediazide photosensitive layer with a developing soln. of an aq. alkali silicate soln. contg. a chelating agent. CONSTITUTION:The o-quinonediazide photosensitive layer is processed with a developing soln. made of an aq. alkali silicate soln. contg. 0.01-1wt% chelating agent. As the chelating agent, a compd. soluble in aq. alkali soln. and having >=50% Ca ion-sequestering rate, such as ethylenediaminetetraacetic acid or its potassium or sodium salt, is embodied. |
