发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To form excellent film efficiently with a compact sputtering device by providing plural sets of opposed targets which face each other by way of a spacing, forming magnetic fields in the perpendicular direction between the opposed targets and transferring a substrate on the side of the opposed targets in the perpendicular direction. CONSTITUTION:The 1st opposed targets T1 consisting of targets TA1, TB1 and the 2nd opposed targets T2 consisting of targets TA2, TB2 are juxtaposed in an array shape in the perpendicular direction thereof. Permanent magnets 301- 303 are disposed being the targets TA1-TB2 in such a way that the polarities thereof are made the same in direction and the magnetic lines of force thereof are perpendicular to the targets TA1-TB2. A substrate 20 is transferred by a substrate transfer means 200 so as to move laterally with respect to the spaces S1, S2 of the targets T1, T2. A sputtering gas is supplied thereafter into a vacuum vessel 10, and electricity is transmitted from power sources 61, 62 to the targets, whereby sputtering is accomplished continuously on the substrate 20.
申请公布号 JPS58189371(A) 申请公布日期 1983.11.05
申请号 JP19820070246 申请日期 1982.04.28
申请人 TEIJIN KK 发明人 KADOKURA SADAO;HONJIYOU KAZUHIKO;NAOE MASAHIKO
分类号 C23C14/36;C23C14/35;C23C14/56;H01L21/285;H01L21/31 主分类号 C23C14/36
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