发明名称 FABRICATION OF BOLD FACE PATTERN
摘要 PURPOSE:To enlarge a line width sufficiently even at the acute angle part or the protruded part of a pattern, by a method wherein a gap is arranged between the fine image pattern layer of a manuscript and the photosensitive part of a photosensitive material to be subjected to the formation of a thickened pattern while a light scattering layer is arranged to the incident light side of the manuscript. CONSTITUTION:A gap is arranged between the fine image pattern layer of a manuscript having a fine image pattern 10 and the photosensitive layer 12 of a photosensitive material to be subjected to the formation of a thickened pattern while a light scattering layer 14 showing, for example, a milky white color is arranged so as to be contacted with the manuscript in the incident light side thereof. A bold face pattern having an ideal shape free from a narrow part in an enlarged line even in the acute angle part or the protruded part of the fine image pattern of the manuscript is obtained.
申请公布号 JPS58188659(A) 申请公布日期 1983.11.04
申请号 JP19820072869 申请日期 1982.04.30
申请人 TOPPAN INSATSU KK 发明人 HANIYUU TOSHIAKI;TAKESHITA SUSUMU
分类号 B41J1/00;G03F1/00 主分类号 B41J1/00
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