发明名称 PATTERN SIZE MEASURING DEVICE
摘要 PURPOSE:To measure the sizes of a minute pattern simply and accurately, by performing the positioning of an end point in measuring the length of a pattern in such a way that the point coincides with an index by the control of the polarization beam of an electronic microscope and the control of a moving stage. CONSTITUTION:The image of a patter 9 is formed on an observing screen 8 of a CRT tube. A positioning index 10 and the corner of a pattern 9, whose sizes are to be measured, are made to coincide. The reading of an XY position display 15 at this time is made to be xs1 and ys1. Then an electron beam 6 os an electronic microscope is deflected by a minute amount, and the pattern 9 and the index 10 are made to coincide accurately. The amount of deflection of the electron beam at this time is made to be xd1 and yd1. Then, a stage 2 is moved by xs2 and ys2 so that the other measuring end point of the pattern 9 coincide with the index 10, and the electron beam 6 is deflected by a minute amount xd2 and yd2. Thus both are made to coincide accurately. The sizes of the pattern 9 are simply and accurately measured by the extraction of square root of (xs1+ xd1-xs2-xd2)<2>+(ys1+yd1-ys2-yd2)<2>.
申请公布号 JPS58187803(A) 申请公布日期 1983.11.02
申请号 JP19820146793 申请日期 1982.08.26
申请人 FUJITSU KK 发明人 FURUKAWA YASUO;INAGAKI YUUSHI
分类号 G01B15/00;(IPC1-7):01B15/00 主分类号 G01B15/00
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