| 摘要 |
A method for detecting a position of a micro-mark on a substrate by detecting reflected electrons or secondary electrons radiated from said substrate which is scanned by an electron beam. A pilot mark which has a predetermined relative position with respect to the micro-mark and which is larger than the micro-mark is provided in a range where the electron beam is scanned. First, the pilot mark is scanned by the electron beam and the position of the pilot mark is read out, then, the position of the micro-mark is determined by the read out position of the pilot mark which has a predetermined relative position with respect to the micro-mark.
|
