| 摘要 |
Methods and apparatus for enabling a stage apparatus to scan an object within a vacuum environment associated with an extreme ultraviolet lithography system are disclosed. According to one aspect of the present invention, a stage apparatus that is suitable for operation in a vacuum environment includes a coarse stage assembly that include a coarse stage and at least one air bearing that is vacuum-compatible. The stage apparatus also includes a fine stage assembly which has a fine stage that is arranged substantially adjacent to the coarse stage. The fine stage is arranged to be positioned relative to the coarse stage using electromagnetic energy.
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