| 发明名称 |
Pattern measuring method |
| 摘要 |
A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
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| 申请公布号 |
US7288764(B2) |
申请公布日期 |
2007.10.30 |
| 申请号 |
US20070651498 |
申请日期 |
2007.01.10 |
| 申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
SASAJIMA FUMIHIRO;KIMURA YOSHIHIRO;KOMURO OSAMU |
| 分类号 |
G01B15/00;G01N23/00;G01N23/225;G21K7/00;H01J37/28 |
主分类号 |
G01B15/00 |
| 代理机构 |
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| 主权项 |
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