| 摘要 |
<p>An apparatus and a method for processing a substrate are provided to minimize a footprint required for the apparatus, and to assist flow of liquid chemical, which is photoresist solution, on an upper side of the substrate, since the substrate is supported within a vessel inclined to the ground. An apparatus for processing a substrate(1) comprises a support plate(12), a liquid chemical nozzle(22), a support shaft(16), a vessel(30), and a driving unit(15,18). The support plate where a substrate(W) is loaded thereon, is able to spin around a rotary shaft which is perpendicular to one side, wherein the support plate upholds the substrate perpendicular or inclined to the ground. The liquid chemical nozzle, disposed perpendicular to the substrate, feeds liquid chemical, which is photoresist solution, on an upper side of the support plate during the process. The support shaft having one end connected to a lower side of the support plate, upholds the support plate. The vessel having an upper opening is disposed to surround the support plate. The driving unit lifts the support shaft to expose the support plate to the upper side of the vessel through the opening.</p> |
