| 摘要 |
PURPOSE:To manufacture a mask base without using a resist film through a simple process with a high yield, by bringing the metallic mask layer on a glass base into contact with a master mask base, and irradiating it through the master mask layer with laser light. CONSTITUTION:A metallic mask layer 2 is formed on a glass base 1 and it is exposed to an oxygen plasma atmosphere 6. The metallic mask layer 2 of the base 1 is brought into contact with the metallic mask layer 2b of a master mask base 4a, and the layer 2 is irradiated with laser light through the base 4a. The laser light 7 not intercepted with the layer 2b directly irradiates the layer 2 to form a corrosion resistant film 8. The base 1 having the layer 2 with the film 8 is immersed in an etching soln. to remove the layer 2 except the formed film 8 by etching. The mask base 2 is obtained by removing the unnecessary film 8. |
