发明名称 A thin film MOS transistor and an active matrix liquid crystal display device
摘要 A thin film MOS transistor includes a silicon layer (202) whose thickness, at least in the channel region is less than 2500 ANGSTROM . The silicon layer may be a polycrystalline silicon layer and its thickness in the channel region may be less than its thickness in the source and drain regions. Such thin film MOS transistors may be used in active matrix liquid crystal display devices having a plurality of picture elements arranged in a matrix, each picture element having a thin film MOS transistor as a switching element. <IMAGE>
申请公布号 GB2118365(A) 申请公布日期 1983.10.26
申请号 GB19830009750 申请日期 1983.04.11
申请人 KABUSHIKI KAISHA * SUWA SEIKOSHA 发明人 TOSHIHIKO * MANO;TOSHIMOTO * KODAIRA;HIROYUKI * OSHIMA
分类号 G02F1/1362;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/13;H01L29/786;(IPC1-7):01L27/13;09F9/35 主分类号 G02F1/1362
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