| 摘要 |
PURPOSE:To obtain a positive type photosensitive compsn. high in sensitivity and suitable for preparation of integrated circuits, by combining an alkali-soluble novolak resin with 1,2-quinonediazide compd. CONSTITUTION:A photosensitive resin compsn. contains an alkali-soluble novolak resin and a 1,2-quinonediazide compd. represented by formula I or II (R1, R3 are each alkyl, phenyl, or aralkyl; R2, R4, R5 are each 1,2-naphthoquinonediazide-4-sulfonyl group or 1,2-benzoquinone-4-sulfonyl group) at a I /II molar ratio of 1/9-9/1. The novolak resin to be used is prepared by addition condensing one of phenols with one of aldehydes, preferably, at a phenol-aldehyde ratio of 0.7-1 by mol in the presence of an acid catalyst. |
