发明名称 SPIN COATER
摘要 PURPOSE:To enhance the stopping positional accuracy for a semiconductor substrate by a method wherein a high speed rotary motor and a low speed rotary motor are equipped, then a resist is made uniform by using the high speed rotary motor, and the low speed rotary motor is used when the rotating semiconductor substrate is stopped. CONSTITUTION:A control 12 operates a drive part 7 so as to lower a rotary transmission part 5 and releases it resulting in stopping the high speed rotary motor 3, and thus makes a brake 13 work. At the point that the number of revolutions of a table 1 detected by a sensor 11 becomes 10 and several revolutions, the control 12 releases the brake 13 and operates the drive part 7, then contacts the rotary transmission part 6 with an idler contact rotary plate 6' via gears 8 and 9 resulting in the rotation of the low speed rotary motor 4, and thereafter rotates the table 1 at a low speed of several RPM. After the control 12 decides the rotation stopping position for the substrate 2 on the table 1 by the sensor 11 and stops the motor 4, the unloading of the substrate 2 is performed so as to operate the drive part 7 to release the rotary transmission part 6. When the next substrate is loaded on the table 1, above-mentioned processes are repeated.
申请公布号 JPS58182825(A) 申请公布日期 1983.10.25
申请号 JP19820065521 申请日期 1982.04.21
申请人 TOKYO SHIBAURA DENKI KK 发明人 USUDA KINYA
分类号 H01L21/027;G03F7/16;(IPC1-7):01L21/30 主分类号 H01L21/027
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