发明名称 |
Integrated circuit photomask |
摘要 |
A photomask formed of a transparent dielectric substrate, such as glass and quartz based substrates, having a conductive surface adjacent region, which is patterned with sequential overcoatings of a composite chrome oxide layer and a chrome film. The mask comprises a combination of varied reflectivities to provide proper densities for the opaque areas of the mask.
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申请公布号 |
US4411972(A) |
申请公布日期 |
1983.10.25 |
申请号 |
US19810336005 |
申请日期 |
1981.12.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
NARKEN, BERNT;SCHICK, HENRY C. |
分类号 |
G03F1/00;G03F1/14;H01L21/027;(IPC1-7):B32B3/00;B32B7/00;G03F7/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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