| 摘要 |
PURPOSE:To enable the simple optical adjustment of a device by detecting the slight ruggedness on the surface of a sample to be observed and enabling the observation over the entire surface of said surface at one time. CONSTITUTION:The luminous flux 22 from a spot light source 21 is diffused by a diffusion optical system 23, is focused through a projecting/condensing optical system 24 and is projected, for example, to a mirror surface 26 such as the surface of a silicon wafer. The reflected light thereof is received and focused in said system 24 and is further focused and reduced with a focusing optical system 26. The focused flux is projected on a photodetection phane 27. The luminous flux 22 from the source 21 is diffused with the system 23 with this device; therefore, the distance from the system 24 is made short, and since the reflected light is focused and reduced with the system 26, the distance between the plane 27 and the system 24 is made short. |
