| 摘要 |
PURPOSE:To eliminate the causes of errors due to erroneous optical axis to improve throughput in a series of processes by a method wherein the inspecting and correcting processes are constituted so that they may be performed within the same system. CONSTITUTION:An inspecting and correcting photomask 2 is placed on a sample plate 1 for alignment to scan a region divided from the mask 2 by means of the laser beams oscillated by a laser oscillator 3. Then the scanning signals corresponding to any inspected patterns are detected by the detectors 5-7. The scanning signals detected by the detectors 5-7 are respectively transmitted to a judging circuit 8 to be compared with the scanning signals based on the design data transmitted from a design data processing circuit 9 and discriminated if said signals are related to any defective pattern. Any position coordinates discriminated to be a defective pattern are memorized by a correcting coordinate memory circuit 10. Next, when the inspection of the mask 2 is finished, a correcting coordinate is read out of the memory circuit 10 to locate the sample plate 1 on the corrected position focusing the laser beams on the corrected position to correct the defective pattern. |
