发明名称 |
DEPOSITING FILM ONTO SUBSTRATE |
摘要 |
A single-crystal ingot I of boron-doped silicon is electron-beam heated in ionized hydrogen. Using an electrode E to apply an electric field from the ingot I towards a heated substrate S, which is r.f. biassed, an amorphous boron-doped silicon film deposits on the substrate S. Intrinsic and n-type material can also be produced. |
申请公布号 |
GB8324779(D0) |
申请公布日期 |
1983.10.19 |
申请号 |
GB19830024779 |
申请日期 |
1983.09.15 |
申请人 |
NATIONAL RESEARCH DEVELOPMENT CORPORATION |
发明人 |
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分类号 |
B01J19/08;C23C14/00;C23C14/32;H01L21/203;(IPC1-7):C23C13/00 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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