| 摘要 |
Provided is a substrate liquid processing apparatus (1) that processes a substrate (2) with a processing liquid, with an improved throughput. The substrate liquid processing apparatus (1) includes: a processing liquid storage unit (3) configured to store the processing liquid therein; a processing liquid heating unit (18) configured to heat the processing liquid; a controller (8) configured to control the processing liquid heating unit; a temperature sensor (21); and a concentration sensor (20) connected to the controller (8). The controller (8) is configured to: measure a concentration of the processing liquid with the concentration sensor (20), measure a temperature of the processing liquid with the temperature sensor (21), calculate a boiling point corresponding to the measured concentration of the processing liquid, and control the output of the processing liquid heating unit, based on the boiling point and the measured temperature of the processing liquid. |
