| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment device, etc., with which it is possible to measure with higher accuracy the temperature of a rotary table having a film formation substrate placed thereon and heated by a heating unit.SOLUTION: Provided is a heat treatment device for applying heat treatment to a revolving substrate W placed in the placement area of a rotary table 2 that is disposed in a vacuum container 11, where a first radiation thermometer 43 measures the apparent temperature TRm of the rotary table 2 heated by a heating unit 33. A contact type thermometer 42 measures the contact type temperature of a temperature correction member 41 having emissivity corresponding to the rotary table 2, and a second radiation thermometer measures the apparent temperature TR of the temperature correction member 41. A temperature correction unit 71 calculates, on the basis of correspondence between the apparent temperature TR of the temperature correction member 41 and a contact measurement temperature TC, an actual temperature TCm from the apparent temperature TRm of the rotary table 2 in which its emissivity is reflected.SELECTED DRAWING: Figure 9 |
