Power MOSFET.

摘要

A plurality of drain projections (22a-1, 22a-2, ...) are formed on a surface of a semiconductor substrate (21) in column and row directions. A portion is formed between two longitudinally adjacent drain projections (22a-1, 22a-2) so as to form a source electrode contact. A drain projection (22b-2) which is formed alongside the longitudinally adjacent drain projections (22a-1, 22a-2) is offset therefrom by a length corresponding to half of a long side of each projection.