| 摘要 |
PURPOSE:To obtain a thin film of an amorphous body with superior ionic conductivity, by forming a thin film by sputtering in a region where Li2O is contained by a specified amount in a ternary composition diagram having Li2O, Ta2O5 and Nb2O5 at the vertexes. CONSTITUTION:Sputtering is carried out using a target made of a mixture consisting of a lithium tantalate-lithium niobate composition represented by a formula (1-x) LiTaO3.xLiNbO3 (0<=x<=1.0) or a mixture forming the composition by sputtering and a lithium compound forming Li2O by sputtering. Thus, a thin film of amorphous lithium thantalate-lithium niobate is prepared. The composition of the thin film is within a region (quadrilateral ABCD) where Li2O is contained by 40% (segment BC)-67% (segment AD) in the ternary composition diagram having Li2O, Ta2O5 and Nb2O5 at the vertexes. |
