发明名称 |
Normally-on enhancement mode MOSFET with negative threshold gating |
摘要 |
A VLSI enhancement mode metal oxide semiconductor field effect transistor operative to be Normally-On except during those periods when a negative threshold voltage is applied to the gate electrode. A submicron MOSFET channel having relatively high resistivity substrate allows for source and drain PN junction with overlapping depletion regions to create an electric field that promotes a surface inversion layer in the channel for conduction between the source and drain in a Normally-On mode except upon application of a negative gate threshold that acts to invert the channel surface to a non-conducting mode.
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申请公布号 |
US4409607(A) |
申请公布日期 |
1983.10.11 |
申请号 |
US19800172338 |
申请日期 |
1980.07.25 |
申请人 |
XEROX CORPORATION |
发明人 |
RUMENNIK, VLADIMIR |
分类号 |
H01L29/10;H01L29/78;(IPC1-7):H01L27/02;H01L29/12 |
主分类号 |
H01L29/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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