发明名称 Normally-on enhancement mode MOSFET with negative threshold gating
摘要 A VLSI enhancement mode metal oxide semiconductor field effect transistor operative to be Normally-On except during those periods when a negative threshold voltage is applied to the gate electrode. A submicron MOSFET channel having relatively high resistivity substrate allows for source and drain PN junction with overlapping depletion regions to create an electric field that promotes a surface inversion layer in the channel for conduction between the source and drain in a Normally-On mode except upon application of a negative gate threshold that acts to invert the channel surface to a non-conducting mode.
申请公布号 US4409607(A) 申请公布日期 1983.10.11
申请号 US19800172338 申请日期 1980.07.25
申请人 XEROX CORPORATION 发明人 RUMENNIK, VLADIMIR
分类号 H01L29/10;H01L29/78;(IPC1-7):H01L27/02;H01L29/12 主分类号 H01L29/10
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