| 摘要 |
PURPOSE:To improve the response speed, reproducing proerty and stability of balanced potential value by forming a layer of a platinum base metal material on the surface of a substrate body by vacuum deposition after the substrate is made of a conductive material other than the platinum base metal material. CONSTITUTION:A substrate 10 for an ion electrode has a body 11 with a desired shape of a line, bar, disc or the like which is covered with an electrically insulating material 13 such as polyolefin and teflon in the perimeter thereof 11 and a layer 12 of a platinum base metal material is applied direct on the exposed surface of the tip thereof by vacuum deposition. The platinum base metal refers to platinum and an alloy thereof. The substrate body 11 must be made of conductive material other than the platinum base metal. The vacuum deposition is preferably ion sputtering and can be done with a bipolar sputtering device. |
