| 摘要 |
PURPOSE:To realize a stable resist processing at all times, by controlling the opening state of a damper thereby to regulate the air flow in a chamber. CONSTITUTION:A chamber 2 is provided therein with an air flow sensor 10 for detecting the air flow as a flow of air. In response to the detection signal from the sensor 10, the opening state of a damper 14 provided in a duct 8 is controlled by a driving device 15 thereby to regulate the air flow in the chamber 2. Thus, when a wafer 1 is coated with a resist solution 7, the damper 14 is closed to check the flow of air through the chamber 2 to reliably prevent the vaporization of a solvent and the like contained in the resist solution 7 from becoming faster than what is required. When the wafer 1 is being rotated after the coating, the damper 14 is opened to gradually increase the flow of air through the chamber 2. Accordingly, it is possible to reliably prevent a thread-like resist from floating to attach onto the surface of the wafer 1 again. |
