| 摘要 |
A composition represented by chemical formula (I). In chemical formula (I), R^1 represents a hydrogen atom or a methyl group; R^2 represents a C1-C12 hydrocarbon group; X^a and X^b represent each independently an oxygen atom or a sulfur atom; X^11 represents a C1-C12 divalent saturated hydrocarbon group, wherein a hydrogen atom of the saturated hydrocarbon group can be replaced with a fluorine atom; and A^1 represents a C1-C12 divalent saturated hydrocarbon group or *-A^2-X^1-(A^3-X^2)_a-A^4-, wherein * represents the binding site with respect to an oxygen atom, A^2, A^3, and A^4 represent each independently C1-C12 divalent hydrocarbon group, X^1 and X^2 represent each independently -O-, -CO-O-, -O-CO- or -O-CO-O-, and a represents 0 or 1. The composition according to the present invention is suitable for ArF excimer laser lithography, EB lithography, and EUV exposure lithography. |
