Resist material and process for forming fine resist pattern.

摘要

A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula:
wherein R, is methyl group, ethyl group, a halogensub- stituted methyl or ethyl group, a halogen atom or hydrogen atom, R2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and Rf is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an a-cyanoacrylate.