Sensitive resins comprising 2-alkylglycidyl methacrylate homopolymer or copolymer

摘要

Photo, electron beam and x-ray sensitive resins are comprised of a 2-alkylglycidyl methacrylate homopolymer or a copolymer containing at least 50 mol % of alkylglycidyl methacrylate. The resins have excellent resolving power and sensitivity and are useful for negative type resists.