| 摘要 |
PURPOSE:To prevent a substance dissolved in an organic solvent or a solvent from remaining on the surface of a semiconductor substrate by cleaning the substrate with the organic solvent and removing the organic solvent adhered onto the substrate by utilizing a centrifugal force. CONSTITUTION:A plurality of semiconductor substrates 2 are mounted on a substrate supporting tool 3, ethyl alcohol 6 in a container 5 is heated to introduce the vapor into a chamber 1, and the substrate 2 is cleaned with the liquefied ethyl alcohol. A motor 4 is driven to rotate the tool 3 to remove the ethyl alcohol adhered to the substrate by a centrifugal force, valves 10, 11 are opened to introduce clean gas such as nitrogen gas into the chamber 1, and a valve 12 is opened to exhaust the gas in the chamber 1. The cleaned substrate 2 has less remaining ethyl alcohol or remaining substance dissolved in ethyl alcohol on the surface to become extremely clean. |
