发明名称 TRANSFER DEVICE FOR PATTERN
摘要 PURPOSE:To transfer various patterns by one photo-mask, to solve various trouble concerning the manufacture and control of the photo-mask and to improve the accuracy of superposing of each pattern by constituting the photo- mask by a plurality of minute picture elements and controlling each light transmittance of these minute picture elements independently and selectively. CONSTITUTION:A micro-computer 21 each brings several switch of a switch 19 group to ON or OFF state independently on the basis of pattern informations, voltage is applied among minute electrodes 17a under ON state and one electrode 16, a liquid crystal 18 is brought to a transparent state among both electrodes and light from a light source 10 can be transmitted toward a wafer substrate 13, and the light does not transmit to sections not applied. Consequently, when the switches 19 corresponding to the desired minute electrodes are turned ON or OFF, light transmitting or non-transmitting patterns are formed arbitrarily while using the minute electrodes as picture plans, and transferred onto the substrate 13. Accordingly, the pattern shape of the photo-mask 12 can be formed freely through the selective ON-OFF combination of the switch 19 group.
申请公布号 JPS58166722(A) 申请公布日期 1983.10.01
申请号 JP19820049134 申请日期 1982.03.29
申请人 HITACHI SEISAKUSHO KK 发明人 MIZUNO FUMIO;TANABE YOSHIKAZU
分类号 H01L21/30;G03F7/20;H01L21/027;(IPC1-7):01L21/30 主分类号 H01L21/30
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