| 摘要 |
PURPOSE:To obtain desired patterns simply, to transfer patterns without using a photo-mask and to improve the accuracy of superposing of each pattern by forming a generating source of stimulus beams forming patterns by a plurality of minute unit generating sources and arranging the generating sources in plane shape and selectively driving desired unit generating sources. CONSTITUTION:A micro-computer 17 each brings several switch of a switch 15 group to ON or OFF state independently on the basis of pattern informations, and lights corresponding light-emitting elements 14. Consequently, light patterns are formed in the stimulus beam generating source 10 by the light-emitting elements lit, and the patterns are imaged onto the surface of the resist 13 of a wafer substrate 12 by an optical system 11. Accordingly, the patterns are transferred completely. When the forms of the patterns are to be altered, the switch 15 group may be changed over and operated accordingly. |
